Gilbertsville-mount Upton High School Alumni
Gilbertsville, New York (NY)
Alumni Stories
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George Olin
Class of 1970
Class Valedictorian
(Sadly, George passed away in 2009. The following information was provided by his younger brother, Gerry)
Issued Patents (US, Japanese, European, World, Chinese and Canadian)
Country Patent No. Date Assignee__
1. US 6,605,330 20030812 Eastman Kodak Co.
Phase-change recording element for write once applications
2. US 6,544,617 20030408 Eastman Kodak Co.
Phase-change recording element for write once applications
3. US 6,497,988 20021224 Eastman Kodak Co.
Phase-change recording element for write once applications
4. US 6,224,960 20010501 Eastman Kodak Co.
Phase-change recording medium for write once applications
5. US 6,168,901 20010102 Eastman Kodak Co.
Recordable optical element using low absorption materials
6. China 1,274,152 20001122 Eastman Kodak Co.
Phase-change recording medium for write once applications
7. EP 1,054,393 20001122 Eastman Kodak Co.
Phase-change recording medium for write once applications
8. Japan 11,232,695 19990827 Eastman Kodak Co.
Optical disk, on which recording is enabled, having metallic intermediate layer
9. EP 917,138 19990519 Eastman Kodak Co.
Recordable optical disks with metallic interlayer
10. Japan 11,096,590 19990409 Eastman Kodak Co.
High performance media for optical recording
11. EP 895,233 19990203 Eastman Kodak Co.
High performance media for optical recording
12. US 5,882,760 19990316 Eastman Kodak Co.
Recordable optical disks with metallic interlayer
13. US 5,843,553 19981201 Eastman Kodak Co.
High performance media for optical recording
14. Japan 10,119,437 19980512 Eastman Kodak Co.
Recording media for recordable element
15. EP 837,461 19980422 Eastman Kodak Co.
Recording media for recordable element
16. US 5,733,623 19980331 Eastman Kodak Co.
Recording media for recordable element
17. Japan 8,258,416 19961008 Eastman Kodak Co.
Recordable optical element using low absorption material
18. EP 731,462 19960911 Eastman Kodak Co.
Recordable optical element using low absorption material
19. Japan 6,255,255 19940913 Eastman Kodak Co.
Recordable optical element made of low absorptivity material
20. EP 605,891 19940713 Eastman Kodak Co.
Recordable optical element using low absorption material
21. Japan 4,506,430 19921105 Eastman Kodak Co.
Master for optical element replication
22. EP 478,714 19920408 Eastman Kodak Co.
Master for optical element replication
23. US 5,051,340 19910924 Eastman Kodak Co.
Master for optical element replication
24. WO 9,100,598 19910110 Eastman Kodak Co.
Master for optical element replication
25. Canada 2,057,017 19901224 Eastman Kodak Co.
Master for optical element replication
26. US 4,405,733 19830920 Xerox Corporation
Composite quasi-crystalline material
27. US 4,089,684 19780516 Xerox Corporation
Imaging method utilizing the chemical reactivity of donor-acceptor mixtures
Publications
1. Kodak phase-change media for optical tape applications, Tyan, Y.-S., Preuss, Donald R., Olin, George R., Vazan, Fridrich, Pan, Kee-chaun and Raychaudhuri, Pranab K., Electronic Imaging Storage Research Labs, Eastman Kodak Co., Rochester, NY, 14650-2017, NASA Conference Publication 3198, Vol. II, 1993, 499-511.
2. Through-thickness mark length variations in laser-irradiated thin films, Bartholomeusz, Brian and Olin, George R., Mass Memory Div., Eastman Kodak Co., Rochester, NY, 14650-2017, Opt. Eng. (Bellingham, Wash.), 1990, 29, 8, 988-92.
3. Linear free energy relationships. Part 10. Synthesis, thermal, spectral, electrochemical, and hole transport (conduction) properties of some novel carbazole derivatives, Gibson, Harry W., Olin, George R. and Pochan, John M., Xerox Webster Res. Cent., Xerox Corp., Webster, NY, 14580, J. Chem. Soc., Perkin Trans. 2, 1981, 9 , 1267-73.
4. On the mechanism of the cadmium sulfide sensitized photoreduction of heptylviologen in nonaqueous solution, Saeva, Franklin D., Olin, George R., Harbour, John R., Xerox Webster Res. Cent., Xerox Corp., Webster, NY, 14580, J. Chem. Soc., Chem. Commun., 1980, 9 , 401-3.
5. Electron-donating properties of oxygen vs. sulfur. Redox potentials for some pyrylium and thiapyrylium salts, Saeva, F. D., Olin, G. R., Xerox Webster Res. Cent., Webster, NY, 14580, J. Am. Chem. Soc., 1980, 102, 1, 299-303.
6. Novel applications of chiral polymer and liquid crystalline polymer hosts for the characterization of intramolecular charge-transfer and exciton bands in dicesium tetracyanoplatinate by circular dichroism spectropolarimetry, Saeva, F. D., Olin, G. R., Ziolo, R. F., Day, P., Xerox Webster Res. Cent., Xerox Corp., Webster, NY, 14580, J. Am. Chem. Soc., 1979, 101, 18, 5419-21.
7. Mechanism of the cadmium sulfide sensitized photooxidation of Leuco Crystal Violet in nonaqueous solution, Saeva, Franklin D., Olin, George R., Harbour, John R., Xerox Webster Res. Cent., Xerox Corp., Webster, NY, 14580, J. Chem. Soc., Chem. Commun., 1978, 10, 417-18.
8. Circular dichroism spectropolarimetric characterization of J-aggregate species of some pyrylium dyes, Saeva, F. D., Olin, G. R., Turner, S. R., Yanus, J. F., Sandman, D. J., Xerox Webster Res. Cent., Xerox Corp., Webster, NY, 14580, Photogr. Sci. Eng., 1978, 22, 3, 129-32.
9. Circular dichroism of trigonal selenium formed in chiral polymer matrix, Saeva, F. D., Olin, G. R., Chu, J. Y. C., Webster Res. Cent., Xerox Corp., Rochester, NY, 14580, Mol. Cryst. Liq. Cryst., 1977, 41, 1, 5-9.
10. The extrinsic circular dichroism of J-aggregate species of achiral dyes, Saeva, F. D., Olin, G. R., Webster Res. Cent., Xerox Corp., Webster, NY, 14580, J. Am. Chem. Soc., 1977, 99, 14, 4848-50.
11. Carbocation photochemistry. Electron transfer mechanism for the pyrylium salt sensitized photo-oxidation of leuco crystal violet, Saeva, Franklin D., Olin, George R., Webster Res. Cent., Xerox Corp., Webster, NY, J. Chem. Soc., Chem. Commun., 1976, 22, 943-4.
12. Utilization of the cholesteric ï‚® nematic phase transition for the evaluation of polarization spectra with unpolarized light, Saeva, F. D., Olin, G. R., Webster Res. Cent., Xerox Corp., Webster, NY, Mol. Cryst. Liq. Cryst., 1976, 35, 3-4, 319-24.
13. Extrinsic circular dichroism in twisted nematic mesophases, Saeva, F. D., Olin, G. R., Webster Res. Cent., Xerox Corp., Webster, NY, J. Am. Chem. Soc., 1976, 98, 10, 2709-11.
14. Asymmetric synthesis in a cholesteric liquid crystal solvent, Saeva, F. D., Sharpe, P. E., Olin, G. R., Webster Res. Cent., Xerox Corp., Webster, NY, J. Am. Chem. Soc., 1975, 97, 1, 204-5.
15. Cholesteric liquid crystal induced circular dichroism (LCICD). VI. LCICD behavior of benzene and some of its mono- and disubstituted derivatives, Saeva, F. D., Sharpe, P. E., Olin, G. R., Rochester Res. Cent., Xerox Corp., Webster, NY, J. Amer. Chem. Soc., 1973, 95, 23, 7660-3.
16. Cholesteric liquid crystal induced circular dichroism (LCICD). VII. LCICD of achiral solutes in lyotropic cholesteric mesophases, Saeva, F. D., Olin, G. R., Rochester Res. Cent., Xerox Corp., Webster, NY, J. Amer. Chem. Soc., 1973, 95, 23, 7882-4.
17. Cholesteric liquid crystal induced circular dichroism (LCICD). V. Mechanistic aspects of LCICD, Saeva, F. D., Sharpe, P. E., Olin, G. R., Rochester Res. Cent., Xerox Corp., Webster, NY, J. Amer. Chem. Soc., 1973, 95, 23, 7656-9.
(Sadly, George passed away in 2009. The following information was provided by his younger brother, Gerry)
Issued Patents (US, Japanese, European, World, Chinese and Canadian)
Country Patent No. Date Assignee__
1. US 6,605,330 20030812 Eastman Kodak Co.
Phase-change recording element for write once applications
2. US 6,544,617 20030408 Eastman Kodak Co.
Phase-change recording element for write once applications
3. US 6,497,988 20021224 Eastman Kodak Co.
Phase-change recording element for write once applications
4. US 6,224,960 20010501 Eastman Kodak Co.
Phase-change recording medium for write once applications
5. US 6,168,901 20010102 Eastman Kodak Co.
Recordable optical element using low absorption materials
6. China 1,274,152 20001122 Eastman Kodak Co.
Phase-change recording medium for write once applications
7. EP 1,054,393 20001122 Eastman Kodak Co.
Phase-change recording medium for write once applications
8. Japan 11,232,695 19990827 Eastman Kodak Co.
Optical disk, on which recording is enabled, having metallic intermediate layer
9. EP 917,138 19990519 Eastman Kodak Co.
Recordable optical disks with metallic interlayer
10. Japan 11,096,590 19990409 Eastman Kodak Co.
High performance media for optical recording
11. EP 895,233 19990203 Eastman Kodak Co.
High performance media for optical recording
12. US 5,882,760 19990316 Eastman Kodak Co.
Recordable optical disks with metallic interlayer
13. US 5,843,553 19981201 Eastman Kodak Co.
High performance media for optical recording
14. Japan 10,119,437 19980512 Eastman Kodak Co.
Recording media for recordable element
15. EP 837,461 19980422 Eastman Kodak Co.
Recording media for recordable element
16. US 5,733,623 19980331 Eastman Kodak Co.
Recording media for recordable element
17. Japan 8,258,416 19961008 Eastman Kodak Co.
Recordable optical element using low absorption material
18. EP 731,462 19960911 Eastman Kodak Co.
Recordable optical element using low absorption material
19. Japan 6,255,255 19940913 Eastman Kodak Co.
Recordable optical element made of low absorptivity material
20. EP 605,891 19940713 Eastman Kodak Co.
Recordable optical element using low absorption material
21. Japan 4,506,430 19921105 Eastman Kodak Co.
Master for optical element replication
22. EP 478,714 19920408 Eastman Kodak Co.
Master for optical element replication
23. US 5,051,340 19910924 Eastman Kodak Co.
Master for optical element replication
24. WO 9,100,598 19910110 Eastman Kodak Co.
Master for optical element replication
25. Canada 2,057,017 19901224 Eastman Kodak Co.
Master for optical element replication
26. US 4,405,733 19830920 Xerox Corporation
Composite quasi-crystalline material
27. US 4,089,684 19780516 Xerox Corporation
Imaging method utilizing the chemical reactivity of donor-acceptor mixtures
Publications
1. Kodak phase-change media for optical tape applications, Tyan, Y.-S., Preuss, Donald R., Olin, George R., Vazan, Fridrich, Pan, Kee-chaun and Raychaudhuri, Pranab K., Electronic Imaging Storage Research Labs, Eastman Kodak Co., Rochester, NY, 14650-2017, NASA Conference Publication 3198, Vol. II, 1993, 499-511.
2. Through-thickness mark length variations in laser-irradiated thin films, Bartholomeusz, Brian and Olin, George R., Mass Memory Div., Eastman Kodak Co., Rochester, NY, 14650-2017, Opt. Eng. (Bellingham, Wash.), 1990, 29, 8, 988-92.
3. Linear free energy relationships. Part 10. Synthesis, thermal, spectral, electrochemical, and hole transport (conduction) properties of some novel carbazole derivatives, Gibson, Harry W., Olin, George R. and Pochan, John M., Xerox Webster Res. Cent., Xerox Corp., Webster, NY, 14580, J. Chem. Soc., Perkin Trans. 2, 1981, 9 , 1267-73.
4. On the mechanism of the cadmium sulfide sensitized photoreduction of heptylviologen in nonaqueous solution, Saeva, Franklin D., Olin, George R., Harbour, John R., Xerox Webster Res. Cent., Xerox Corp., Webster, NY, 14580, J. Chem. Soc., Chem. Commun., 1980, 9 , 401-3.
5. Electron-donating properties of oxygen vs. sulfur. Redox potentials for some pyrylium and thiapyrylium salts, Saeva, F. D., Olin, G. R., Xerox Webster Res. Cent., Webster, NY, 14580, J. Am. Chem. Soc., 1980, 102, 1, 299-303.
6. Novel applications of chiral polymer and liquid crystalline polymer hosts for the characterization of intramolecular charge-transfer and exciton bands in dicesium tetracyanoplatinate by circular dichroism spectropolarimetry, Saeva, F. D., Olin, G. R., Ziolo, R. F., Day, P., Xerox Webster Res. Cent., Xerox Corp., Webster, NY, 14580, J. Am. Chem. Soc., 1979, 101, 18, 5419-21.
7. Mechanism of the cadmium sulfide sensitized photooxidation of Leuco Crystal Violet in nonaqueous solution, Saeva, Franklin D., Olin, George R., Harbour, John R., Xerox Webster Res. Cent., Xerox Corp., Webster, NY, 14580, J. Chem. Soc., Chem. Commun., 1978, 10, 417-18.
8. Circular dichroism spectropolarimetric characterization of J-aggregate species of some pyrylium dyes, Saeva, F. D., Olin, G. R., Turner, S. R., Yanus, J. F., Sandman, D. J., Xerox Webster Res. Cent., Xerox Corp., Webster, NY, 14580, Photogr. Sci. Eng., 1978, 22, 3, 129-32.
9. Circular dichroism of trigonal selenium formed in chiral polymer matrix, Saeva, F. D., Olin, G. R., Chu, J. Y. C., Webster Res. Cent., Xerox Corp., Rochester, NY, 14580, Mol. Cryst. Liq. Cryst., 1977, 41, 1, 5-9.
10. The extrinsic circular dichroism of J-aggregate species of achiral dyes, Saeva, F. D., Olin, G. R., Webster Res. Cent., Xerox Corp., Webster, NY, 14580, J. Am. Chem. Soc., 1977, 99, 14, 4848-50.
11. Carbocation photochemistry. Electron transfer mechanism for the pyrylium salt sensitized photo-oxidation of leuco crystal violet, Saeva, Franklin D., Olin, George R., Webster Res. Cent., Xerox Corp., Webster, NY, J. Chem. Soc., Chem. Commun., 1976, 22, 943-4.
12. Utilization of the cholesteric ï‚® nematic phase transition for the evaluation of polarization spectra with unpolarized light, Saeva, F. D., Olin, G. R., Webster Res. Cent., Xerox Corp., Webster, NY, Mol. Cryst. Liq. Cryst., 1976, 35, 3-4, 319-24.
13. Extrinsic circular dichroism in twisted nematic mesophases, Saeva, F. D., Olin, G. R., Webster Res. Cent., Xerox Corp., Webster, NY, J. Am. Chem. Soc., 1976, 98, 10, 2709-11.
14. Asymmetric synthesis in a cholesteric liquid crystal solvent, Saeva, F. D., Sharpe, P. E., Olin, G. R., Webster Res. Cent., Xerox Corp., Webster, NY, J. Am. Chem. Soc., 1975, 97, 1, 204-5.
15. Cholesteric liquid crystal induced circular dichroism (LCICD). VI. LCICD behavior of benzene and some of its mono- and disubstituted derivatives, Saeva, F. D., Sharpe, P. E., Olin, G. R., Rochester Res. Cent., Xerox Corp., Webster, NY, J. Amer. Chem. Soc., 1973, 95, 23, 7660-3.
16. Cholesteric liquid crystal induced circular dichroism (LCICD). VII. LCICD of achiral solutes in lyotropic cholesteric mesophases, Saeva, F. D., Olin, G. R., Rochester Res. Cent., Xerox Corp., Webster, NY, J. Amer. Chem. Soc., 1973, 95, 23, 7882-4.
17. Cholesteric liquid crystal induced circular dichroism (LCICD). V. Mechanistic aspects of LCICD, Saeva, F. D., Sharpe, P. E., Olin, G. R., Rochester Res. Cent., Xerox Corp., Webster, NY, J. Amer. Chem. Soc., 1973, 95, 23, 7656-9.
Recent Members
| Brandy Ottens | 2011 |
| Don Brooks | 1972 |
| Gene Lum | 1978 |
| Kayla Marie Gager Sulliavn | 2013 |
| Melody Ziobro | 1968 |
| Phil Jensen | 1994 |
| Richard Sorensen Richard Sorensen | 1954 |
| Wayne Glenda Vandusen | 1953 |
Military Alumni
Honoring Our Heroes
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Happy Holidays!
Happy Holidays!